SCIENTIFIC PUBLICATIONS
PROF. DR. A. WUCHER
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156. |
Investigations of molecular depth profiling with dual beam sputtering Lu, C., Wucher, A., Winograd, N., |
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155. |
Ionization probabilities of sputtered indium atoms under atomic and
polyatomic Aum- ion bombardment Samartev, A: V., Heuser, C., Wucher, A., |
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154. |
A statistical approach to molecular delta layer depth profiling Wucher,
A. , Kranztman, KD, Lu,
C., Winograd, N., |
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153. |
Temperature effects in the sputtering of a molecular solid by
energetic atomic and cluster projectiles Brenes, D, A.,Willingham D, Winograd, N, Wucher, A, |
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152. |
Fluid Flow and Effusive Desorption: Dominant Mechanisms of Energy
Dissipation after Energetic Cluster Bombardment of Molecular Solids Brenes, D., A., Garrison, B., J., Winograd,
N., Postawa, Z., Wucher, A.,Blenkinsopp,
P., |
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151. |
Molecular Depth Profiling of Buried Lipid Bilayers
Using C60-Secondary Ion Mass Spectrometry Lu, C., Wucher, A., Winograd, N., Anal Chem. 83 1 (2011) 351-358 |
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156. |
Investigations of molecular depth profiling with dual beam sputtering Lu, C., Wucher, A., Winograd, N., |
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155. |
Ionization probabilities of sputtered indium atoms under atomic and
polyatomic Aum- ion bombardment Samartev, A: V., Heuser, C., Wucher, A., |
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154. |
A statistical approach to molecular delta layer depth profiling Wucher,
A. , Kranztman, KD, Lu,
C., Winograd, N., |
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153. |
Temperature effects in the sputtering of a molecular solid by
energetic atomic and cluster projectiles Brenes, D, A.,Willingham D, Winograd, N, Wucher, A, |
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152. |
Fluid Flow and Effusive Desorption: Dominant Mechanisms of Energy
Dissipation after Energetic Cluster Bombardment of Molecular Solids Brenes, D., A., Garrison, B., J., Winograd,
N., Postawa, Z., Wucher, A.,Blenkinsopp,
P., |
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150. |
Ionization effects in molecular
depth profiling of trehalose films using
buckminsterfullerene (C60) cluster ions Lu, C., Wucher, A., Winograd, N., Surf. Interface Anal. . 43 1-2 (2011) 99 |
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149. |
Fundamental studies of
molecular depth profiling using organic delta layers as model systems Lu, C., Wucher, A., Winograd, N., Surf. Interface Anal. . 43 1-2 (2011) 81 |
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143. |
Investigating the fundamentals
of molecular depth profiling using strong-field photoionization
of sputtered neutrals, Willingham D, |
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142. |
A statistical model describing delta layer sputter depth profiles Wucher, A. , Kranztman, KD, Surface and Interface Analysis (2011) |
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141. |
Retrospective sputter depth profiling using 3D mass spectral imaging
techniques Zheng,L., Wucher,A.; Winograd N., Applied Surface Science (2011), 41 |
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140. |
Predicting Kinetic Electron Emission in MD-Simulations of Atomic
Collision Cascades Duvenbeck,A; Wucher,A. Physical
Review B, (2010), 5715-5720 |
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139. |
Fluence Effects in C60 bombardment of Silicon Krantzman,K.D.; Wucher,A., Journal of
Physical Chemistry C, (2010), 5480-5490 full pdf file |
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138. |
Influence of the polar angle of incidence on secondary ion formation
in self-sputtering silver Weidtmann,B.; Hanke,S.; Duvenbeck,A; Wucher,A., Surface
and Interface Analysis, full pdf file |
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137. |
Strong field photoionization of neutrals and
the fundamentals of molecular depth profiling Willingham,D.; Wucher,A.; Winograd,N., Journal of Chemical Physics, (2010),
5391-5399 full pdf file |
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136. |
Kinetic excitation of solids induced by energetic particle
bombardment: Influence of impact angle Heuser,C.; Marpe,M.; Diesing,D.; Wucher,A., Nuclear
Instruments & Methods in Physics Research B., (2009), 601-604 |
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135. |
The influence of projectile charge state on ionization probabilities of
sputtered atoms Meyer,S.; Wucher,A. Nuclear
Instruments & Methods in Physics Research B, (2009), 646, 648 full pdf file |
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134. |
HICS: Highly charged ion collisions with
surfaces Peters,T.; Haake,C.; Hopster,J.; Sokolovsky,V.; Wucher,A.; Schleberger,M.
Nuclear Instruments & Methods in Physics Research B, (2009), 687-690 full pdf file |
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133. |
Crystallographic effects in the kinetic excitation of metal surfaces:
A computational study Weidtmann,B.; Duvenbeck,A.; Hanke,S.; Wucher,A., Nuclear
Instruments & Methods in Physics Research B, (2009), 598-600 full pdf file |
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132. |
Molecular sputter depth profiling using carbon cluster beams Wucher,A.; Winograd,N., (2010),
Analytical and Bioanalytical Chemistry, 105-114 full pdf file |
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131. |
Retrospective sputter depth profiling using 3D mass spectral imaging
techniques Zheng,L.; Wucher,A.; Winograd,N., (2011), Surface and Interface Analysis 43,
41-44 full pdf file |
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130. |
Predicting
Secondary Ion Formation in Molecular Dynamics Simulations of Sputtering Weidtmann,B.; Duvenbeck,A; Wucher,A., (2008), Applied Surface Science 813-815 full pdf file |
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129. |
Three-dimensional Molecular
Imaging using Mass Spectrometry and Atomic Force Microscopy Wucher,A.; Cheng,J.; Zheng,L.; Willingham,D.; Winograd,N.,(2008), Applied Surface Science, 984-986 full pdf file |
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128. |
On the internal
energy of sputtered clusters |
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127. |
Molecular Depth Profiling using a C60 Cluster Beam: the
Role of Impact Energy |
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126. |
A simple erosion
dynamics model of molecular sputter depth profiling |
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125. |
Kinetic electron
excitation of solids induced by fast particle bombardment |
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124. |
Molecular depth
profiling of trehalose using a C60 cluster
ion beam |
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123. |
Fundamental Studies
of Molecular Depth Profiling and 3-D Imaging using Langmuir-Blodgett Films as
a Model |
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122. |
Depth resolution
during C60+ profiling of multilayer molecular
films |
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121. |
Modeling hot
electron generation induced by electron promotion in atomic-collision
cascades in metals |
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120. |
Hot electrons
induced by cold multiply charged ions |
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119. |
Formation of atomic
secondary ions in sputtering |
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118. |
Predicting secondary ion formation in molecular dynamics
simulations of sputtering |
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117. |
Energy Deposition during
Molecular Depth Profiling Experiments with Cluster Ion Beams |
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116. |
Potential electron emission
induced by multiply charged ions in thin film junnel
junctions |
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115. |
Photo and particle induced
transport of excited carriers in thin film tunnel junctions |
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114. |
Protocols for Three-Dimensional Molecular Imaging using Mass
Spectrometry |
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113. |
The role of electronic friction
of low-energy recoils in atomic collision cascades |
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112. |
Electron promotion and
electronic friction in atomic collision cascades |
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111. |
On the role of electronic
friction and electron promotion in kinetic excitation of solids |
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110. |
Sputtering: Experiment |
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109. |
Kinetic excitation of solids: The concept of electronic friction |
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108. |
Molecular secondary ion formation under cluster bombardment: A
fundamental review |
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107. |
Kinetic energy distributions of
neutral In and In2 sputtered by polyatomic ion bombardment |
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106. |
Chemically alternating
Langmuir-Blodgett thin films as a model for molecular depth profiling by mass
spectrometry |
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105. |
Molecular Depth Profiling with Cluster Ion Beams |
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104. |
Yields and ionization
probabilities of sputtered Inn particles under atomic and
polyatomic Aum ion bombardment |
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103. |
Determination of energy
dependent ionization probabilities for sputtered particles |
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102. |
Low energy electronic
excitation in atomic collision cascades: a nonlinear transport model |
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101. |
Energetic Ion Bombardment of Ag Surfaces by C+60
and Ga+ Projectiles |
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100. |
Laser post-ionization secondary neutral mass spectrometry for
ultra-trace analysis of samples from space return missions |
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99. |
Sputtering of Indium using Aum Projectiles: Transition from Linear
Cascade to Spike Regime |
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98. |
The use of MIM tunnel junctions
to investigate kinetic electron excitation in atomic collision cascades |
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97. |
Molecular Depth-Profiling of
Histamine in Ice using a Backmininster fullerence probe |
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96. |
Self Sputtering Yields of
Silver under Bombardment with polyatomic Projectiles |
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95. |
Electronic Excitation in Atomic
Collision Cascades |
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94. |
Depth-Profiling of
Langmuir-Blodgett Films with a Buckminsterfullerene Probe |
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93. |
Kinetic electron excitation in
atomic collision cascades |
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92. |
The Use of C60
Cluster Projectiles for Sputter Depth Profiling of Polycrystalline Metals |
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91. |
Cluster Formation at Metal Surfaces
under Bombardment with SFm+(m = 1,..,5) and Ar+
Projectiles |
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90. |
Computer simulation of low-energy
electronic excitations in atomic collision cascades |
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89. |
C60 Molecular Depth
Profiling of a Model Polymer |
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88. |
Depth Profiling Studies of
Multilayer Films with a C60+ Ion Source |
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87. |
Depth Profiling of
Polycrystalline Multilayers using a
Buckminsterfullerene Projectile |
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86. |
Sputtering of Ag under C60+
and Ga+ Projectile Bombardment |
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85. |
Sputtering of Indium Using
Polyatomic Projectiles |
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84. |
Molecular Depth Profiling in
Ice Matrices Using C60 Projectiles |
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83. |
Molecule-specific imaging with mass
spectrometry and a buckminsterfullerene probe: Application to characterizing
solid-phase synthesized combinatorial libraries |
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82. |
Formation of excited Ag atoms
in sputtering of silver |
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81. |
Laser Desorption Imaging of
Proteins from Ice via UV Femtosecond Laser Pulses |
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80. |
Ionization Probability of Atoms and Molecules sputtered from a Cesium covered
Silver Surface |
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79. |
Projectile Size Effects on
Cluster Formation in Sputtering |
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78. |
Formation of Sputtered Silver
Clusters under Bombardment with SF5+ Ions |
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77. |
Sputtering of Ag atoms into Metastable Excited States |
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76. |
Generation of Large Indium
Clusters by Sputtering |
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75. |
Self Sputtering of Silver under
Bombardment with Polyatomic Projectiles |
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74. |
Internal Excitation of
Sputtered Neutral Indium Clusters |
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73. |
Laser Postionization:
Fundamentals |
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72. |
Formation of Clusters in
Sputtering |
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71. |
Self-sputtering of silver by
mono- and polyatomic projectiles: A molecular dynamics investigation |
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70. |
Formation of Sputtered
Clusters: A Multistep Model |
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69. |
Ionization Probability of
Sputtered Clusters |
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68. |
A Method for Quantitative
Determination of Secondary Ion Formation Probabilities |
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67. |
Temperature Dependence of
Sputtered Cluster Yields |
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66. |
Cluster Formation under
Bombardment with Polyatomic Projectiles |
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65. |
Formation of Large Clusters
during Sputtering of Metal Surfaces |
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64. |
On the Temperature Dependence
of sputtered Cluster Yields |
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63. |
Microanalysis with Secondary
Ion and Secondary Neutral Mass Spectrometry |
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62. |
Effects of oxygen dosing on Ca
cluster yields and energy distributions |
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61. |
Detection of Large Neutral
Clusters in Sputtering |
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60. |
Sputtering of Atoms in Fine
Structure States: A Probe of Excitation and De-excitation Events |
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59. |
VUV Single Photon versus Femtosecond Multiphoton
Ionization of Sputtered Germanium Clusters |
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58. |
Surface and Thin Film Analysis
with Electron and Mass Spectrometric Techniques |
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57. |
Fragmentation lifetimes and the
internal energy of sputtered clusters |
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56. |
Experiment and Simulation of
cluster emission from 5 keV Ar
--> Cu |
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55. |
Quantitation of Single Photon Ionization Laser SNMS |
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54. |
Formation of Sputtered
Semiconductor Clusters |
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53. |
Internal Energy of Sputtered
Clusters: The Influence of Bombarding Conditions |
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52. |
Yields and Energy Distributions
of Sputtered Semiconductor Clusters |
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51. |
Energy- and Angle-Dependent Excitation
Probability of Sputtered Silver Atoms |
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50. |
High Frequency Electron-Gas
Secondary-Neutral-Mass Spectrometry: Evaluation of Transient Sputtering
Effects |
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49. |
Metastable Excitation of Sputtered Silver Atoms |
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48. |
Formation of Metastable Excited States during Sputtering of Transition
Metals |
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47. |
Cluster Formation in
Sputtering: A Molecular Dynamics Study using the MD/MC-Corrected Effective
Medium Potential |
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46. |
Depth Profiling of Tantalum
Oxide Layers by Laser-SNMS |
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45. |
Cluster Emission in Sputtering |
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44. |
Population of sputtered Metastable Silver Atoms |
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43. |
The Formation of Clusters
during Ion Induced Sputtering of Metals |
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42. |
Electronic Excitation during
Sputtering of Silver Atoms |
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41. |
Oberflächenanalytik
mit dem Laser |
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40. |
On the Role of Molecular
Fragmentation during Depth Profiling of Tantalum Oxide Layers by Laser SNMS |
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39. |
Laterally Resolved Chemical
Analysis of Solid Surfaces by Laser- SNMS |
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38. |
Relative Elemental Sensitivity
Factors in Non-Resonant Laser-SNMS |
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37. |
Rotational and vibrational excitation of sputtered silver dimers |
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36. |
VUV photoionization
of sputtered neutral silver clusters |
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35. |
Electron impact and single photon ionization cross sections of neutral
silver |
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34. |
The charge state of sputtered metal clusters |
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33. |
Detection of sputtered metastable atoms by autoionization |
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32. |
Yields of sputtered metal clusters: the influence of surface structure |
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31. |
Internal energy of sputtered metal clusters |
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30. |
The mass distribution of sputtered metal clusters II. Model
calculation |
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29. |
The mass distribution of sputtered metal clusters I. Experiment |
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28. |
Sputtered Neutral Silver Clusters up to Ag18 |
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27. |
Ro-Vibrational population of sputtered metal
dimers: The influence of unimolecular |
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26. |
Microanalysis of Solid Surfaces by Secondary Neutral Mass Spectrometry |
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25. |
Characterization of the Fluxes of Neutral and Positively Charged
Clusters |
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24. |
Formation of Neutral and Positively Charged Clusters during Sputtering
of Silver |
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23. |
Unimolecular Decomposition in the Sputtering of Metal Clusters |
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22. |
Energy Dependent Studies of Anisotropic Atomic Sputtering of Ni(111) |
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21. |
Internal and Translational Energy of Sputtered Silver Dimers: A Molecular Dynamics Study |
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20. |
Sputtering of Silver Dimers: A Molecular Dynamics
Calculation Using a Many-Body Embedded-Atom Potential |
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19. |
Formation of Secondary Cluster Ions during Sputtering of Silver and
Copper |
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18. |
Saturation and Fragmentation in Non Resonant Laser Postionization
of Sputtered Atoms and Molecules |
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17. |
Absolute Cross Section for Electron Impact Ionization of Ag2 |
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16. |
Electron Impact Ionization of Small Silver and Copper Clusters |
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15. |
Absolute Depth Profiling of Thin Film Systems by Low Energy Secondary
Neutral Mass Spectrometry |
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14. |
Calibration of SNMS Depth Profile Analysis |
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13. |
Depth Scale Calibration During Sputter Removal of Multilayer Systems
by SNMS |
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12. |
Charakterisierung technischer Oberflächen
für Anwendungen in der mittelständischen Industrie |
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11. |
Emission Energy Dependence of Ionization Probabilities in Secondary
Ion Emission from Oxygen covered Ta, Nb and Cu
Surfaces |
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10. |
Energy dependent Ionization Probabilities for Atomic Secondary Ions |
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09. |
Quantitation of Molecular SNMS Signals |
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08. |
Calculation of Post-Ionization Probabilities as a Function of Plasma
Parameters in Electron Gas SNMS |
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07. |
Angular Distributions of Particles Sputtered from Metals and Alloys |
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06. |
Plasma Studies on the Leybold-Heraeus INA 3
SNMS-System |
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05. |
Relative Sensitivity Factors in Secondary Neutral Mass Spectrometry
SNMS |
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04. |
Absolute Ionization probabilities in Secondary Ion Emission from Clean
Metal Surfaces |
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03. |
Energy Distributions of Metal Atoms and Monoxide Molecules Sputtered
from Oxidized Ta and Nb |
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02. |
Quantitative Analysis of Thin Oxide and Nitride Layers on Tantalum by
Sputtered Neutral Mass Spectrometry |
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01. |
Quantitative Analysis of Thin Oxide Layers on Tantalum by Sputtered
Neutral Mass Spectrometry (SNMS) |